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Adisyn reports verified graphene deposition repeatability and US patent allowance

Adisyn's graphene deposition process has been independently verified as repeatable. The company also received a US patent allowance for its graphene coating technology for metallic surfaces.

Adisyn has published its quarterly activities report for the period ending June 30, 2026, highlighting independent verification of its graphene deposition process's repeatability, a U.S. patent allowance for its core graphene coating technology, and advancements in its radar-absorption program.

The key technical achievement of the quarter was reported in June, when Adisyn confirmed independent expert verification of the repeatability of its graphene deposition process. Through its subsidiary 2D Generation, the company demonstrated continuous graphene film formation on a copper substrate using an industrial Atomic Layer Deposition (ALD) system. The process was maintained below 300°C, significantly under the semiconductor industry's thermal limit of approximately 450°C.

The graphene layer, measuring approximately 1-2 nm in thickness, was verified using two characterization methods. Raman spectroscopy across 10 measurement spots per coupon showed consistent spectral signatures over the entire sample surface. Additionally, UHR-TEM cross-section imaging at the Hebrew University of Jerusalem confirmed a continuous layer with interlayer spacing of 3.4 ± 0.3 Å, consistent with the graphite structure, and lateral continuity across several micrometers.

Repeatability was assessed by executing the same process recipe three times on different days, each yielding consistent layer formation. Uniformity was further evaluated by examining three cross-sections from different positions on the same 1 cm² coupon, all of which produced identical results, indicating even coverage.

Verification was provided by Associate Professor Rakesh Joshi, leader of the Graphene Research Group at UNSW Sydney, who confirmed the results met the standards outlined in the share sale agreement for Adisyn's acquisition of 2D Generation. This follows April's demonstration of full-coverage graphene on a 1 cm² coupon using an industrial ALD system.

In May, the U.S. Patent and Trademark Office allowed Adisyn's patent application No. 18/692,223, covering its core graphene coating technology for metallic surfaces. The patent includes specifications such as defect density at or below 10¹² per cm², surface coverage exceeding 90%, covalent bonding between graphene and the metal substrate, material free of catalytic metal residue, applicability to multiple graphene layers, and deposition by vacuum methods including ALD.

With the repeatability milestone achieved, Adisyn plans to engage more deeply with Tier 1 semiconductor manufacturers and fabs for collaboration, validation, and integration. The company aims to optimize film quality and scale from the 1 cm² coupon to full wafer-level substrates, necessary for commercial manufacturing.

The target application is interconnects. As device geometries shrink, copper interconnects face increased resistance, heat generation, and power loss. Adisyn positions graphene as a solution to these challenges for AI accelerators, GPUs, CPUs, and advanced mobile and networking chips.

In defense, subsidiary 2D Radar Absorbers demonstrated up to 20dB radar signature reduction using graphene-enhanced composites, with a target of 30dB. During the quarter, it secured exclusive worldwide rights from Ramot, Tel Aviv University's technology transfer company, to commercialize graphene-based radar signature reduction technology. This includes a 12-month research program led by Professor Pavel Ginzburg and an MoU with Israeli plastics group Raval to co-develop graphene-enhanced injection-molded parts for drones and UAVs, with a potential 50:50 manufacturing joint venture.

Adisyn concluded the quarter with A$15.489 million in cash and remains debt-free, following an institutional placement that raised A$14 million before costs.

Source: Graphene Feed

Companies mentioned
Adisyn Ltd.·2D Generation Ltd·UNSW Sydney·Ramot·Tel Aviv University·Raval
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